Virtual Characterisation Day - Big Science
FORCE Technology invites to Virtual Characterisation Day - Big Science on 3 November 2021.
On 3 November we have brought together a field of experts that will introduce advanced surface and materials characterisation techniques, with special focus on latest developments within Big Science, unravelling the new opportunities for applied industrial research in product design and development, quality assurance and quality control.
We offer the unique opportunity to have your samples investigated by our experts who will present you the results in real time during the breakout room sessions.
If you have a sample/case study you would like us to investigate then you can contact our analyst specialist Erik Stieper Brok.
We look forward to seeing you in November.
|Big science and ESS
||New opportunities for Industry
||Richard Larsen, DI
The Max IV synchrotron and the materials
|Mads Ry Jørgensen, MaxIV
||Nanometer structure of biomolecules
with small-angle X-ray scattering (SAXS)
||X-ray CT and the SOLID light house
||Carsten Gundlach, DTU
|10.45-11.05||Failure analysis with helium ion
|Till Leissner, SDU|
|11.05-11.25||Characterising surfaces with scanning
|Michael Andersson, Xspect/Bruker|
|11.25-11.45||What is roughness and how to calculate
area roughness correctly
|Alberto Aguerri, Sensofar|
|Virtual lab tour introduction|
|11.45-12.00||Wrap-up on morning programme and
introduction of afternoon demonstrations
|Virtual lab tours
|Energy & utility||Processing &
Meet the speakers
Richard B. Larsen
Richard B. Larsen, Senior Adviser, with a broad experience from working for companies from the Confederation of Danish Industries (DI). He has participated in the development of the Danish ESS-Strategy V.1 as well as V.2 and is Chair of the Danish partnership Linking Industry to Neutrons & X-rays (LINX).
Presentation: New opportunities for Industry
Companies in the Femarn-Øresund Region are being surrounded by world class and in fact world leading large scale facilities which all can be used to push forward the development and implementation of new solution to challenges meeting companies working with biotech as well as inorganic materials. Individual companies should not be expected to use the large scale facilities, but Force Technology in collaboration with universities can provide access to the new solutions and methods coming out of the research using the new facilities as well as of research lighthouses located in our region.
Mads Ry Jørgensen
Mads Ry Jørgensen is an assistant research professor at the Department of Chemistry at Aarhus University and Beamline Manager at DanMAX at MAX IV Laboratory. E-mail: email@example.com, phone: +45 4058 2996.
Presentation: The MAX IV synchrotron and the materials science beamline DanMAX
MAX IV in the southern part of Sweden is the World’s first 4th generation synchrotron – delivering some of the most intense X-ray beams available for all kinds of research. I will introduce MAX IV and part of its instrument portfolio in particular the Danish beamline DanMAX. DanMAX is designed for 3D X-ray imaging and atomic structure determination using diffraction – all under in situ and in operando conditions
Pernille Sønderby Tuelung
Pernille Sønderby Tuelung (KU-Pharma)
Carsten Gundlach (DTU-Imaging Center)
Till Leissner, My name is Till Leissner. I am an Associate Professor in material characterisation and nanofabrication at the Mads Clausen Institute of the University of Southern Denmark in Sønderborg. Through our Center for materials Analysis and Characterisation (C:MAC) we can help your company to analyse and characterize products and components regarding materials, surfaces and interfaces. Please find a virtual tour about our facilities. If you are interested in our services please contact me (+45 6550 8378, firstname.lastname@example.org).
Presentation: Failure Analysis with helium ion microscopy
Reliability research at NanoSYD exploits and advances among others the unique capabilities of the Zeiss Orion NanoFab Helium Ion Microscope for failure analysis of electronic devices. Helium Ion Microscopy is an imaging technique with superior spatial resolution, very large depth of focus and high surface sensitivity. Combined with the ion milling capability, this allows one for 3D visualization of material and device failure features at micro- and nanometer length scales. Possible applications are electronic components packaging and fabrication quality analysis, MEMS quality analysis and defects localization in semiconductor devices. In our presentation I will introduce the imaging technique, discuss the sample preparation requirements and show a number of examples.
Michael Andersson (Xpect/Bruker)
Albergo Aguerri is the vice president of sales for Sensofar Metrology. He has worked for Sensofar for more than 17 years in various company positions. He is a knowledgeable expert of all the optical surface metrology in the market. He is currently leading the worldwide Sales and Applications operations through a network of distributors and own sales and support offices in key markets such as Asia, Germany and USA. Aguerri holds a MSc in photonics from Polytechnic University of Catalonia (UPC).
Presentation: What is roughness and how to calculate area roughness correctly?
Within the past 20 years, surface roughness measurement has taken a 180-degree turn. We now understand the limitations of contact profilometry and have discovered additional possibilities which surface metrology offers us along with its complexities. In this presentation we will explore examples on how to correctly measure and analyze nanometer roughness on optical components and up to tens of microns typical of additive manufacturing.